Gustaaf Van Tendeloo
简 历:Gustaaf Van Tendeloo教授,比利时皇家艺术与科学院院士,2004年至2017年任比利时安特卫普大学EMAT电镜中心主任。2015年他凭借在电子显微学领域和材料科学领域的巨大贡献和突出成就,荣获比利时最高科学大奖(Award De Leeuw-Damry-Bourlart,被称作“比利时的诺贝尔奖”),同年受聘为武汉理工大学战略科学家,并着手组建电镜团队,2017任武汉理工大学纳微结构研究中心主任。他参与编撰的《Handbook of Microscopy(显微学指南)》(1997年,Wiley)和《Handbook of Nanoscopy(纳米显微学指南)》(2012年,Wiley)是电镜领域的经典教材之一。目前他已在《Nature》和《Science》本刊或子刊上发表学术论文17篇,总被引超过45000次,H因子97。Gustaaf Van Tendeloo教授作为世界电子显微技术领域的领军人物,不仅在学术领域取得了辉煌成就,而且将EMAT团队推向了巅峰,使EMAT团队成为了欧洲乃至世界上最顶尖的电子显微中心之一,同时他也有着广泛的国际合作经历,与中国、美国、俄罗斯、秘鲁、印度、以及欧洲各国研究人员都有着密切合作关系。
题 目:Advanced Electron Microscopy for Advanced Materials
摘 要:In modern electron microscopy, with the introduction of aberration corrected instruments, monochromators, better X-ray and/or electron detectors and in-situ sample holders, not only atomic resolution is now becoming more standard, even in 3D, but also chemical and even electronic mapping is now possible down to an atomic scale. We will present several examples for this. For beam sensitive materials or nanomaterials however, life is more complex. Some of these soft matter materials only support a low intensity electron beam for a few seconds, or even less. This makes that not the instrument, but the sample is the limiting factor for imaging. However, using minimum beam current we have been able to image light elements in Li-based batteries. We will also report very recent results on 3D imaging at atomic resolution under a gaseous atmosphere and at elevated temperatures.